Film-forming device "Corial 200 Series"
A plasma etching and deposition device that can be configured according to its purpose.
We would like to introduce our "Corial 200 Series." This research and development equipment utilizes a common platform and can be configured as RIE, ICP, ICP+RIE, ICP-CVD, or PECVD depending on the application. Wafer sizes are 50mm, 100mm, 150mm, and 200mm. 【Features】 ■ Utilizes a common platform ■ RIE, ICP, ICP+RIE, ICP-CVD, or PECVD equipment ■ Designed for research and development ■ Wafer sizes are 50mm, 100mm, 150mm, and 200mm * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.
- Company：プラズマ・サーモ・ジャパン
- Price：Other
